The Vortex is Airgard’s original scrubber model and includes Airgard’s specialized gas entry device. When inlet restrictions occur, the gas inlet port is changed out manually in less than five minutes.

Eductor Cone
Keeps exhaust line at slightly negative pressure (a nominal draw of 1”-2” of water.)

Packed Column
The final polish.
Packing requires no maintenance or replacement.

Fresh Water Input
Strategic position increases efficiency, minimizes water use and eliminates foam.

Sump Geometry
Unique pump input, drain, and fresh water input locations prevent foaming, sediment, and minimize water use.

Gas Inlet Devices
specialized gas inlet devices minimize rate of restriction and automatic gas inlet plunger removes restrictions without process interruptions.

Second Scrubbing Chamber
Five fine spray, high velocity nozzles ensure effective removal of impurities.

First Scrubbing Chamber
Coarse spray, high flow nozzle coats chamber and removes bulk impurities.

Pump
Corrosion resistant, high output and long life. Recircluates 35GPM.

Small Footprint
24 ½” X 32 ½”

Epi
The Vortex is Airgard's original scrubber model and includes Airgard's specialized gas entry device. When inlet restrictions occur, the gas inlet port is changed out manually in less than five minutes. The service frequency for the manual Airgard gas inlet depends on the process conditions (i.e. the silicon source, silicon flow, reactor type). The Airgard manual gas inlet requires replacement every 7 to 30 days, for the most demanding Epi processes. The Vortex comes with a single speed pump with a simple on/off switch and the city water input is turned on manually. Upgrade options are available for the Vortex model.

Poly Etch/CVD
The Vortex model for the Poly Etch and CVD processes includes all the features of the Epi Vortex. Due to the low flow rates of these processes, this model includes the option of up to 4 gas inlet ports on each scrubber.